Microelectronics Research Center Georgia Institute of Technology
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PMMA Process

1. 60sec spincoat PMMA (see PMMA spin speed curves)
2. 180C hotplate for 90sec
3. expose (650uC/cm2 base dose for features larger than 1um)
4. 2min immersion develop 1:1 MIBK:IPA
5. rinse IPA


To remove PMMA:

1. soak in Acetone

OR

2. O2 plasma


for metal liftoff process:

1. soak in Acetone 5 - 15 min
2. flow Acetone over wafer using squeeze bottle to remove large pieces of metal
3. place in fresh Acetone in a container and float in ultrasonic bath for 5 - 15 min